Ion Beam Etching System VEECO ME601 |
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|---|---|---|
| Kaufmann broad beam ion source | ||
| Applications | Ion milling | |
| Broad Ion beam assisted deposition | ||
| Sample size | Up to 4" wafers | |
Belongs to: Physics and Engineering of Amorphous and Nanostructured Materials (FEMAN)
| Contact Person: | Enric Bertran |
|---|---|
| Joan Esteve |
