PECVD - HWCVD |
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|---|---|---|
| Cluster tool with | 2 PECVD Chambers | |
| 1 HWCVD Chamber | ||
| Robotic-cotrolled central chamber | ||
| Deposition area | Up to 10cm x 10cm | |
| Applications | a-Si deposition | |
| micro contact - Si deposition | ||
| Doping | ||
Belongs to: Physics and Engineering of Amorphous and Nanostructured Materials (FEMAN)
| Contact Person: | Enric Bertran |
|---|---|
| Joan Esteve |
