Thin Film and Nanostructure electrodeposition group (Ge-CPN) has wide experience in the electrodeposition processes, both in the analysis of the first stages, as in the material preparation. Catalytic, magnetic and magnetoresistive materials are developed for implementation in sensors, devices, electro- or photocatalysts.
For some time now, ionic liquids (RTIL and DES) have been incorporated, totally or partially, as solvents in electrodeposition processes, expanding the interest to new effects derived from the ionic liquid-electrode interactions, which significantly could affect the early stages of electrodeposition processes. Taking advantage of these new solvents, for different interests, nanostructures have been prepared in a wide type of substrates (ITO, carbon, metals, Si/seed layer, free-standing MWCN structures, and well-ordered Pt or Au monocrystals). These new solvents minimize, in some cases, undesirable processes occurring in aqueous media.
Main research lines are the following:
– Preparation of thin films, multilayers and composites with embedded micro or nanometric particles, which can contribute to the properties modification of the electrodeposited materials
– Electrochemical preparation of the materials in the micro- and nano-level for the application in sensors or magnetic devices.
– Analysis of the medium influence on well-ordered surfaces using ionic liquids (RTIL, DES). Preparation of multifunctional nanostructures.
– Electrochemical preparation of biocompatible structures for intra-extracellular applications.